Planar Magnetron with Electron Injection and Reflective Electrode: Numerical Simulation of Functioning Processes.

Numerical simulation of the effect of a reflective electrode on the ion composition of the planar magnetron plasma, into the discharge region of which an electron beam with independently controlled electron current and energy is injected, is performed. The numerical simulation results indicate that in such a configuration, higher concentrations of ions of the working gas (argon) and the target cathode (copper) of the magnetron are achieved due to a higher degree of confinement in the region of the plasma generation of injected electrons due to their partial reflection and deflection in the retarding field of the reflective electrode. The simulation results agree satisfactorily with the experimental mass-charge composition of the plasma ions of such a magnetron. [ABSTRACT FROM AUTHOR]