Cite
Measurement of secondary electron emission coefficient of plane target in plasma immersion ion implantation.
MLA
Nakamura, Keiji, et al. “Measurement of Secondary Electron Emission Coefficient of Plane Target in Plasma Immersion Ion Implantation.” Electrical Engineering in Japan, vol. 151, no. 3, May 2005, pp. 1–7. EBSCOhost, https://doi.org/10.1002/eej.20096.
APA
Nakamura, K., Ando, M., & Sugai, H. (2005). Measurement of secondary electron emission coefficient of plane target in plasma immersion ion implantation. Electrical Engineering in Japan, 151(3), 1–7. https://doi.org/10.1002/eej.20096
Chicago
Nakamura, Keiji, Masaki Ando, and Hideo Sugai. 2005. “Measurement of Secondary Electron Emission Coefficient of Plane Target in Plasma Immersion Ion Implantation.” Electrical Engineering in Japan 151 (3): 1–7. doi:10.1002/eej.20096.