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Infrared Laser Photochemistry of Trichlorosilane.

Authors :
Apatin, V. M.
Laptev, V. B.
Ryabov, E. A.
Source :
High Energy Chemistry. Jul/Aug2003, Vol. 37 Issue 4, p272-278. 7p.
Publication Year :
2003

Abstract

IR multiphoton dissociation of trichlorosilane molecules in scavenger gas (O2, CO2, OCS, halomethanes, BCl3, TiCl4, etc.) media was studied. Stable, volatile dissociation products were determined. It was shown that the product formation mechanism depends on the partial pressure of SiHCl3. At a high pressure (≥400–800 Pa) of SiHCl3, its photolysis in a mixture with fluorine-, chlorine-, or bromine-containing scavengers led to the formation of products of the SiF4 – nCln and SiBr4 – nCln type, where n = 1–4. An SiHCl3 conversion into SiCl4 higher than 70% could be achieved. The formation mechanism was proposed for the photolysis products. At a low SiHCl3 pressure (<70 Pa), the formation of a stable volatile product was observed only in a mixture with BCl3, which resulted from the reaction of insertion of SiCl2 in the B–Cl bond. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00181439
Volume :
37
Issue :
4
Database :
Academic Search Index
Journal :
High Energy Chemistry
Publication Type :
Academic Journal
Accession number :
16920630
Full Text :
https://doi.org/10.1023/A:1024763103696