Synthesis and lithographic properties of positive-tone poly(benzoxazole)s by the effect of amine end-cappers.

Positive-tone photosensitive poly(o-hydroxyamide) (PHA) precursors were synthesized from the polycondensation reaction of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (Bis-AP-AF), 4,4'-oxybisbenzoyl chloride (OBC) and three mono-functional amines as end-cappers. The synthesized PHA precursors were characterized and converted to polybenzoxazoles (PBOs) by thermal cyclization reaction. The photoresist formulations composed of the prepared PHA precursor and diazonaphthoquinone (DNQ) photoactive compound were prepared, and the photolithographic properties of the photoresist formulations were investigated by UV light irradiation, followed by a 2.38 wt.% tetramethylammonium hydroxide (TMAH) solution treatment in terms of the chemical structure of end-cappers. The dissolution rate at 2.38 wt.% TMAH solution by various UV light exposure doses and the shrinkage ratio by thermal cyclization of micro-patterns by UV light irradiation and developing process from the photoresist formulations are affected by the chemical structure of end-cappers. [ABSTRACT FROM AUTHOR]