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Wet-chemical intercalation of Bi4TaO8Br with self-adaptive structural deformation for enhanced photocatalytic performance.
- Source :
-
Chemical Communications . 8/28/2023, Vol. 59 Issue 67, p10145-10148. 4p. - Publication Year :
- 2023
-
Abstract
- A small specific surface area and severe charge carrier recombination greatly limit the photocatalytic efficiency of semiconductors. Herein, we developed a novel wet-chemical intercalation strategy by using the NaBH4 reagent for in situ intercalation-assisted expansion and surface/interface reconstruction of Bi4TaO8Br, which exhibits an enhanced specific surface area and charge carrier separation features. This work highlights intercalation of semiconductors for achieving enhanced photocatalytic performance and provides a new idea to synergistically regulate the morphology and surface/interface composition of semiconductors. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 13597345
- Volume :
- 59
- Issue :
- 67
- Database :
- Academic Search Index
- Journal :
- Chemical Communications
- Publication Type :
- Academic Journal
- Accession number :
- 169994754
- Full Text :
- https://doi.org/10.1039/d3cc02874g