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Ionization enhancement of zirconium atoms in inductively coupled discharge
- Source :
-
Surface & Coatings Technology . Jun2005, Vol. 196 Issue 1-3, p188-191. 4p. - Publication Year :
- 2005
-
Abstract
- Abstract: This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached ∼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements. [Copyright &y& Elsevier]
- Subjects :
- *PARTICLES (Nuclear physics)
*SOLUTION (Chemistry)
*ATOMS
*ELECTRON distribution
Subjects
Details
- Language :
- English
- ISSN :
- 02578972
- Volume :
- 196
- Issue :
- 1-3
- Database :
- Academic Search Index
- Journal :
- Surface & Coatings Technology
- Publication Type :
- Academic Journal
- Accession number :
- 17059383
- Full Text :
- https://doi.org/10.1016/j.surfcoat.2004.08.125