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Ionization enhancement of zirconium atoms in inductively coupled discharge

Authors :
Nakamura, Keiji
Yoshinaga, Hiroaki
Yukimura, Ken
Source :
Surface & Coatings Technology. Jun2005, Vol. 196 Issue 1-3, p188-191. 4p.
Publication Year :
2005

Abstract

Abstract: This paper reports on ionization of sputtered zirconium (Zr) atoms in inductively coupled argon discharge. A Zr+ ion flux fraction to overall Zr species mainly was obtained by deposition measurements with the retarding bias method, and the fraction approximately reached ∼100%. The Zr+ ion fraction was affected by the discharge pressure, and hardly dependent on the discharge power corresponding to an electron density. This result suggested that the Zr+ ions were generated with ionization process other than electron impact such as Penning effect. There was an optimal pressure to produce the Zr+ ions, and the Zr+ ion density estimated from the deposition measurement was consistent with that obtained from a combination of Langmuir probe measurements and mass spectroscopic measurements. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
02578972
Volume :
196
Issue :
1-3
Database :
Academic Search Index
Journal :
Surface & Coatings Technology
Publication Type :
Academic Journal
Accession number :
17059383
Full Text :
https://doi.org/10.1016/j.surfcoat.2004.08.125