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Lifting and drainage of Sisko fluid film with surface tension: A theoretical study on stationary points and thickness of uniform film.

Authors :
Ashraf, H.
Siddiqa, Ayesha
Rehman, Hamood Ur
Siddiqui, A. M.
Rahman, Jamshaid Ul
Source :
International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics. 10/20/2023, Vol. 37 Issue 26, p1-23. 23p.
Publication Year :
2023

Abstract

This paper accords with the theoretical study of lifting and drainage of Sisko fluid film on a vertically upward moving cylinder with surface tension. The flow on cylinder is induced by the upward motion of the cylinder, gravity and surface tension gradient. The resulting nonlinear ordinary differential equation is solved for a series form solution by making use of the Adomian decomposition method (ADM). Expressions for the flow variables like velocity, volume flow rate, shear stress and surface tension are derived. Positions of stationary points and thickness of uniform film are computed numerically in MATHEMATICA. The inverse capillary number C, Stokes number S t , Sisko fluid parameter β and fluid behavior index n emerged as flow control parameters. The study showed that the positions of stationary points relocate towards the surface of the cylinder by the increase of C and S t while their positions relocate towards the fluid–air interface with increasing β and n. Thickness of uniform film decreases when the values of C and S t are increased whilst it increases with the increase of β and n. Analogy between the Newtonian fluid and the Sisko fluid's shear thinning and shear thickening behaviors for positions of stationary points, thickness of uniform film and surface tension is also made. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
02179792
Volume :
37
Issue :
26
Database :
Academic Search Index
Journal :
International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics
Publication Type :
Academic Journal
Accession number :
171957451
Full Text :
https://doi.org/10.1142/S0217979223503046