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Fast Optical Proximity Correction Using Graph Convolutional Network With Autoencoders.

Authors :
Cho, Gangmin
Kim, Taeyoung
Shin, Youngsoo
Source :
IEEE Transactions on Semiconductor Manufacturing. Nov2023, Vol. 36 Issue 4, p629-635. 7p.
Publication Year :
2023

Abstract

OPC is a very time consuming process for mask synthesis. Quick and accurate OPC using GCN with layout encoder and mask decoder is proposed. (1) GCN performs a series of aggregation with MLP for correction process. A feature of a particular polygon is aggregated with weighted features of neighbor polygons; this is a key motivation of using GCN since one polygon should be corrected while its neighbors are taken into account for more accurate correction. (2) GCN inputs are provided by a layout encoder, which extracts a feature from each layout polygon. GCN outputs, features corresponding to corrected polygons, are processed by a mask decoder to yield the final mask pattern. (3) The encoder and decoder originate from respective autoencoders. High fidelity of decoder is a key for OPC quality. This is achieved by collective training of the two autoencoders with a single loss function while the encoder and decoder are connected. Experiments demonstrate that the proposed OPC achieves 47% smaller EPE than OPC using a simple MLP model. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
08946507
Volume :
36
Issue :
4
Database :
Academic Search Index
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
173370009
Full Text :
https://doi.org/10.1109/TSM.2023.3306751