Trimethylsilyl Azide Promoted Shono Oxidation of N , N -Dialkyl Amides.

This article discusses a study on the direct alkoxylation of N,N-dialkyl amides using the Shono reaction. The researchers found that electron-donating and electron-withdrawing groups on the amide were well tolerated, while a para-nitro group lowered the reaction efficiency. They also explored the role of TMSN3 in the reaction and proposed a radical-relay process. Overall, this study provides a new strategy for the alkylation of N,N-dialkyl amides, expanding the scope of the Shono reaction. [Extracted from the article]