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Direct Printing of Ultrathin Block Copolymer Film with Nano-in-Micro Pattern Structures.

Authors :
Tae Wan Park
Young Lim Kang
Eun Bin Kang
Hyunsung Jung
Seoung-Ki Lee
Geon-Tae Hwang
Jung Woo Lee
Si-Young Choi
Sahn Nahm
Se-Hun Kwon
Kwang Ho kim
Woon Ik Park
Source :
Advanced Science. 10/17/2023, Vol. 10 Issue 29, p1-9. 9p.
Publication Year :
2023

Abstract

Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano-to-micro patterns effectively with functionalities for electronic device applications. However, the nTP process is hindered by several critical obstacles, such as sub-20 nm mold technology, reliable large-area replication, and uniform transfer-printing of functional materials. Here, for the first time, a dual nanopatterning process is demonstrated that creates periodic sub-20 nm structures on the eight-inch wafer by the transfer-printing of patterned ultra-thin (<50 nm) block copolymer (BCP) film onto desired substrates. This study shows how to transfer self-assembled BCP patterns from the Si mold onto rigid and/or flexible substrates through a nanopatterning method of thermally assisted nTP (T-nTP) and directed self-assembly (DSA) of Si-containing BCPs. In particular, the successful microscale patternization of well-ordered sub-20 nm SiOx patterns is systematically presented by controlling the self-assembly conditions of BCP and printing temperature. In addition, various complex pattern geometries of nano-in-micro structures are displayed over a large patterning area by T-nTP, such as angular line, wave line, ring, dot-in-hole, and dot-in-honeycomb structures. This advanced BCP-replicated nanopatterning technology is expected to be widely applicable to nanofabrication of nano-to-micro electronic devices with complex circuits. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21983844
Volume :
10
Issue :
29
Database :
Academic Search Index
Journal :
Advanced Science
Publication Type :
Academic Journal
Accession number :
173775373
Full Text :
https://doi.org/10.1002/advs.202303412