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High figure of merit spin polarized electron sources grown via MOCVD.

Authors :
Belfore, Benjamin
Masters, Adam
Poudel, Deewakar
Blume, Greg
Polly, Stephen
Wang, Erdong
Hubbard, Seth M
Stutzman, Marcy
Grames, Joseph Michael
Poelker, Matt
Grau, Matt
Marsillac, Sylvain
Source :
Applied Physics Letters. 11/27/2023, Vol. 123 Issue 22, p1-6. 6p.
Publication Year :
2023

Abstract

Spin polarized photocathodes are key to the future operation of electron accelerators such as the ones at Thomas Jefferson National Accelerator Facility and Brookhaven National Laboratory. Currently, these photocathodes come in short supply due to limited production by molecular beam epitaxy. By developing a process to implement similar structures using metal organic chemical vapor deposition, the availability of these devices can be increased. In this paper, we detail the implementation of recent photocathode advancements via metal organic chemical vapor deposition process and show an improvement in both polarization and quantum efficiency of our devices compared to those fabricated via molecular beam epitaxy, with devices reaching 82% polarization and 2.9% quantum efficiency. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
123
Issue :
22
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
173977229
Full Text :
https://doi.org/10.1063/5.0170106