Cite
Ion behavior impact on ITO thin film fabrication via DC magnetron sputtering with external anode.
MLA
Huang, Tianyuan, et al. “Ion Behavior Impact on ITO Thin Film Fabrication via DC Magnetron Sputtering with External Anode.” Vacuum, vol. 221, Mar. 2024, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.vacuum.2023.112848.
APA
Huang, T., Mo, C., Cui, M., Li, M., Ji, P., Tan, H., Zhang, X., Zhuge, L., & Wu, X. (2024). Ion behavior impact on ITO thin film fabrication via DC magnetron sputtering with external anode. Vacuum, 221, N.PAG. https://doi.org/10.1016/j.vacuum.2023.112848
Chicago
Huang, Tianyuan, Chaochao Mo, Meili Cui, Maoyang Li, Peiyu Ji, Haiyun Tan, Xiaoman Zhang, Lanjian Zhuge, and Xuemei Wu. 2024. “Ion Behavior Impact on ITO Thin Film Fabrication via DC Magnetron Sputtering with External Anode.” Vacuum 221 (March): N.PAG. doi:10.1016/j.vacuum.2023.112848.