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Anisotropic phonon properties in SiP2 monolayer: A first-principles study.

Authors :
Hou, Yinlong
Ren, Kai
Wei, Yu
Cui, Zhen
Wang, Ke
Source :
Vacuum. Apr2024, Vol. 222, pN.PAG-N.PAG. 1p.
Publication Year :
2024

Abstract

Recently, the micromechanical exfoliation method has effectively separated the two-dimensional (2D) SiP 2 flake, which exhibits superior performance in field-effect transistors and photodetectors. In this paper, first-principles calculations were utilized to investigate the phononic properties of a SiP 2 monolayer, which would be significant to explain the thermal deformation of 2D SiP 2 -based devices. We found that the acoustic phonon branches of SiP 2 monolayer demonstrate significant in-plane anisotropy. The anisotropic ratios for the group velocities are 2.41 and 1.66 for the longitudinal and transverse acoustic modes, respectively. Meanwhile, the anisotropic ratio of the negative thermal expansion coefficient only considering the contribution from acoustic phonons is 0.14, while this ratio is ∼0.279 occurs at 120 K when both acoustic and optical phonons are taken into account. For the Raman-active optical phonons, the largest Grüneisen constant of these Raman-active phonons reaches 22.76, while the largest anisotropic ratio of phonon frequency is up to 2.16. To interpret this significant in-plane anisotropy, we calculated the electron density distribution, crystal orbital Hamilton populations (COHP) and interatomic force constants (IFCs), and found the maximal IFC in the x -direction is 5.79 times greater than y -direction, suggesting it as a major origin of the phononic anisotropy. • The significant anisotropic ratios for the thermal expansion constant of SiP 2 monolayer is 0.279 at 120 K. • All the optical phonons are Raman-active with unusual Grüneisen constants. The largest Grüneisen constant is 22.76. • The major origin of in-plane anisotropy is the interatomic force constant with anisotropic ratio of 5.79. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0042207X
Volume :
222
Database :
Academic Search Index
Journal :
Vacuum
Publication Type :
Academic Journal
Accession number :
176035615
Full Text :
https://doi.org/10.1016/j.vacuum.2024.113094