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Dependence of oxygen flow rate on piezoelectric photothermal spectra of ZnO thin films grown by a reactive plasma deposition

Authors :
Kakeno, T.
Sakai, K.
Komaki, H.
Yoshino, K.
Sakemi, H.
Awai, K.
Yamamoto, T.
Ikari, T.
Source :
Materials Science & Engineering: B. Apr2005, Vol. 118 Issue 1-3, p70-73. 4p.
Publication Year :
2005

Abstract

Abstract: Undoped and Ga-doped (3wt.%) n-type ZnO thin films were grown by a reactive plasma deposition method on glass substrates at 200°C under oxygen flow rate from 0 to 50sccm. Piezoelectric photothermal spectroscopy (PPTS) was measured for characterizing the ZnO films from the viewpoint of nonradiative recombination processes. Strong peak due to the band edge transition was observed around 3.3eV in all the samples at room temperature. Furthermore, a broad band of the PPT signal at 2.5eV was observed for the undoped ZnO samples grown under low oxygen flow rate. This signal disappeared with increasing the oxygen flow rates and did not appear in the Ga-doped samples. Therefore, it is considered that this PPT signal at 2.5eV was due to the electron transition from the oxygen vacancies. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
09215107
Volume :
118
Issue :
1-3
Database :
Academic Search Index
Journal :
Materials Science & Engineering: B
Publication Type :
Academic Journal
Accession number :
17613069
Full Text :
https://doi.org/10.1016/j.mseb.2004.12.014