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Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings
- Source :
-
Applied Surface Science . May2005, Vol. 245 Issue 1-4, p335-339. 5p. - Publication Year :
- 2005
-
Abstract
- Abstract: Laser conditioning effects of the HfO2/SiO2 antireflective (AR) coatings at 1064nm and the accumulation effects of multi-shot laser radiation were investigated. The HfO2/SiO2 AR coatings were prepared by E-beam evaporation (EBE). The single-shot and multi-shot laser induced damage threshold was detected following ISO standard 11254-1.2, and the laser conditioning was conducted by three-step raster scanning method. It was found that the single-shot LIDT and multi-shot LIDT was almost the same. The damage mostly >80% occurred in the first shot under multi-shot laser radiation, and after that the damage occurring probability plummeted to <5%. There was no obvious enhancement of the laser damage resistance for both the single-shot and multi-shot laser radiation of the AR coatings after laser conditioning. A Nomarski microscope was employed to map the damage morphology, and it found that the damage behavior is defect-initiated for both unconditioned and conditioned samples. [Copyright &y& Elsevier]
- Subjects :
- *LASERS
*COATING processes
*THIN films
*EVAPORATION (Chemistry)
Subjects
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 245
- Issue :
- 1-4
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 17662749
- Full Text :
- https://doi.org/10.1016/j.apsusc.2004.10.028