Cite
Effect of substrate and oxygen-argon ratio on photocatalytic CO2 reduction in ITO films prepared by magnetron sputtering.
MLA
He, Xiong, et al. “Effect of Substrate and Oxygen-Argon Ratio on Photocatalytic CO2 Reduction in ITO Films Prepared by Magnetron Sputtering.” Ceramics International, vol. 50, no. 11, June 2024, pp. 19881–85. EBSCOhost, https://doi.org/10.1016/j.ceramint.2024.03.114.
APA
He, X., Li, T., Zhang, F., Gao, L., Wu, J., Mao, Y., Xie, H., & Li, K. (2024). Effect of substrate and oxygen-argon ratio on photocatalytic CO2 reduction in ITO films prepared by magnetron sputtering. Ceramics International, 50(11), 19881–19885. https://doi.org/10.1016/j.ceramint.2024.03.114
Chicago
He, Xiong, Tao Li, Fan Zhang, Limin Gao, Junhao Wu, Yubo Mao, Haiquan Xie, and Kui Li. 2024. “Effect of Substrate and Oxygen-Argon Ratio on Photocatalytic CO2 Reduction in ITO Films Prepared by Magnetron Sputtering.” Ceramics International 50 (11): 19881–85. doi:10.1016/j.ceramint.2024.03.114.