Growth and Characterization of Fluorocarbon Thin Films from Low Pressure Tetrafluoromethane, Hexafluoroethane and Octafluorocyclobutane Plasmas.

This study aims to explore the plasma polymerization reaction of fluorocarbon gases, with specific focus on three monomers: tetrafluoromethane, hexafluoroethane, and octafluorocyclobutane. Optical emission spectroscopy was employed to observe species within the glow discharge, while detecting plasma species in fluorocarbon plasma polymerization. Fluorocarbon plasma polymerized films surface morphology and roughness were scrutinized using scanning electron microscopy and atomic force microscopy. Chemical bonding on film surfaces was probed using X-ray photoelectron spectroscopy. Experimental outcomes highlight the essential role of chemical interactions between fluorocarbon plasma and monomers, with film surface composition inferred from fluorocarbon ratio analysis. These analyses improve the understanding of fluorocarbon-to-carbon ratio and duty cycle contributions to plasma polymerized film growth, which promises advancements in the ability to tailor fluorocarbon films to specific applications. [ABSTRACT FROM AUTHOR]