A global plasma and surface model of hydrogen/methane inductively coupled discharge to analyze hydrocarbon plasma–surface interactions in extreme-ultraviolet lithography machines.

Hydrocarbon contamination is associated with light transmission losses in modern lithography machines, which contain extreme-ultraviolet-induced plasma. A volume-averaged global and deposition/etch surface model of a reference hydrogen/methane inductive discharge is developed to investigate the plasma–surface interactions. The simulation results are validated against a wide variety of experiments and verified with respect to multiple sets of computational data. The deposition rate is calculated for a variation in methane impurity (10–10 000 ppm), power, pressure, and net mass flow. The simulations conclude that the hydrocarbon plasma deposition can be minimized by reducing methane impurity and excluding solid organic structures. [ABSTRACT FROM AUTHOR]