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Growth mechanism and tribological behavior of electroless Ni-P plating with ultrasonic assistance on titanium alloy substrate.

Authors :
Cao, Jingjing
Yang, Junheng
Zhao, Wenwu
Li, Hezong
Source :
Ferroelectrics. 2024, Vol. 618 Issue 15/16, p2562-2580. 19p.
Publication Year :
2024

Abstract

The aim of this paper is to study the growth mechanism and tribological behavior of electroless Ni-P plating with ultrasonic assistance on TC4 titanium alloy substrate pretreated by zincating and alkaline pre-plating process. The morphology, composition and structure of zincating, pre-plating and electroless Ni-P plating were studied to analyze its growth mechanism. The tribological behavior of electroless Ni-P plating at room temperature was investigated. The results showed that the electroless Ni-P plating had a typical cauliflower-like morphology and microcrystalline structure characteristic. And the morphology of the Ni-P plating under the action of ultrasonic was uniform, compact and smooth. Compared with the TC4 substrate, the friction coefficient and the wear scar width of the plating were reduced by approximately 35 and 70%, indicating that the Ni-P plating improved the wear resistance of TC4. The wear mechanism of the Ni-P plating was adhesive wear under the dominant of plastic deformation, and slightly abrasive wear, while the wear mechanism of TC4 was dominated by adhesive wear, accompanied by abrasive wear and oxidative wear. The ultrasonic cavitation promoted the elemental interdiffusion between the substrate and Ni-P plating resulting in the formation of the diffusion layer. The ultrasonic cavitation and mass transfer effects improve the activity of the deposition surface and the generation of atomic hydrogen, and promote the nucleation and growth of nickel on the deposition surface, as well as the diffusion of Ni2+ and H2PO2− to the deposition surface. The growth rate of the Ni-P cell-like structures in the parallel direction is greater than in the perpendicular direction. The Ni-P plating grows in a layered manner, and the growth mechanism is the heterogeneous nucleation growth mechanism. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00150193
Volume :
618
Issue :
15/16
Database :
Academic Search Index
Journal :
Ferroelectrics
Publication Type :
Academic Journal
Accession number :
181438126
Full Text :
https://doi.org/10.1080/00150193.2024.2320562