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Low-dielectric reprocessable vitrimers via incorporating fluorine moieties and their pattern ability via direct imprinting.

Authors :
Fan, Li.
Xiong, Yang
Liu, Ying
Huang, Yawen
Source :
Journal of Macromolecular Science: Pure & Applied Chemistry. Jan2025, p1-14. 14p. 14 Illustrations, 6 Charts.
Publication Year :
2025

Abstract

AbstractThe current research highlights regarding future low-dielectric resins for circuit boards lie in their recyclability and pattern ability. In the present work, we put forward a new idea to simultaneously achieve the recyclability and pattern ability of low-dielectric resins in circuit board. In detail, a series of low-dielectric vitrimers were prepared by copolymerization of fluorinated monomers followed by employing imine cross-linked network. By incorporating fluorine-contained units, the dielectric constant of the vitrimers reached to ∼2.4, while preserving high mechanical strength around 33 MPa. Moreover, after reprocessing three times, the dielectric constants of the PFS-imines remained almost unchanged and 89% of original mechanical strength was recovered. Owing to the increased chain relaxation, PFS-imines can be multiply patterned by directly imprinting at the temperature above <italic>Tv</italic>. Furthermore, the pattern of PFS-imines is removable and reformed, which may be attributed to their reprocessability. Thus, PFS-imine exhibits pattern ability and recyclability, making it particularly suitable for applications in electronic packaging and circuit boards, compared with that of conventional low-dielectric resins. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10601325
Database :
Academic Search Index
Journal :
Journal of Macromolecular Science: Pure & Applied Chemistry
Publication Type :
Academic Journal
Accession number :
182972216
Full Text :
https://doi.org/10.1080/10601325.2025.2458154