Cubic Mg x Zn1−x O films grown on SiO2 substrates

Abstract: Cubic Mg x Zn1−x O thin films were deposited on amorphous silicon dioxide substrate by reactive electron beam evaporation (REBE) at low temperature (250°C). The characterizations of crystalline structure and morphology of the ternary films demonstrated that the cubic Mg x Zn1−x O films are of highly (001) orientation and have uniform surface. The cubic Mg0.83Zn0.17O film deposited on quartz demonstrates wide band gap (6.45eV) and has very high transparency (>95%) in broad wavelength range from ultraviolet (0.3μm) to mid-infrared light (5.5μm). The refractive indices for the cubic Mg x Zn1−x O decrease as Mg fraction increases. The characters of low optical absorption in broad wavelength range and feasibility of changing refractive index by Mg fraction variation in the ternary Mg x Zn1−x O films could render potential applications in integrated optical devices. [Copyright &y& Elsevier]