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Applications of synchrotron X-rays in microelectronics industry research
- Source :
-
Nuclear Instruments & Methods in Physics Research Section B . Dec2005, Vol. 241 Issue 1-4, p247-252. 6p. - Publication Year :
- 2005
-
Abstract
- Abstract: The high flux and density of X-rays produced at synchrotrons provide the microelectronics industry with a powerful probe of the structure and behavior of a wide array of solid materials that are being developed for use in devices of the future. They also are of great use in determining why currently-used materials and processes sometimes fail. This paper describes the X20 X-ray beamline facility operated by IBM at the National Synchrotron Light Source, and presents a series of three industry challenges and results that illustrate the variety of techniques used and problems addressed. The value of this research ranges from solving short-term, technically specific problems to increasing our academic understanding of materials in general. Techniques discussed include high-resolution diffraction, time-resolved diffraction, texture measurements, and grazing-incidence diffraction. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 0168583X
- Volume :
- 241
- Issue :
- 1-4
- Database :
- Academic Search Index
- Journal :
- Nuclear Instruments & Methods in Physics Research Section B
- Publication Type :
- Academic Journal
- Accession number :
- 19140125
- Full Text :
- https://doi.org/10.1016/j.nimb.2005.07.031