Back to Search
Start Over
On the Stability of MIMO EWMA Run-to-Run Controllers With Metrology Delay.
- Source :
-
IEEE Transactions on Semiconductor Manufacturing . Feb2006, Vol. 19 Issue 1, p78-86. 9p. - Publication Year :
- 2006
-
Abstract
- As production requirements in semiconductor manufacturing continue to escalate, it is rarely possible to perform quality measurements on a product before subsequent process operations are performed. This delay between manufacturing and metrology coupled with inaccurate process models can lead to closed-loop instabilities. This paper investigates the effect of metrology delay on the closed-loop stability of a multiple input-multiple output exponentially weighted moving average run-to-run controller. The generalized Routh-Hurwitz stability criteria are used to derive the necessary and sufficient conditions for stability. A sufficient condition for stability is then derived for systems with any length of metrology delay. This condition states that if all of the eigenvalues of a model-mismatch matrix fall inside a circle with unit radius and centered at {1,0} on the complex plane, then the closed-loop system is stable. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 19
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- 19997973
- Full Text :
- https://doi.org/10.1109/TSM.2005.863211