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Optical immersion further shrinks feature sizes.
- Source :
-
Laser Focus World . Apr2006, Vol. 42 Issue 4, p20-24. 3p. - Publication Year :
- 2006
-
Abstract
- The article focuses on the description obtained using NEMO resulted from the Microlithography conference of scientists from the IBM Almaden Research Center in San Jose, California. NEMO is an interferometric tool for deep ultraviolet optical immersion lithography. The researchers created distinct and uniformly spaced patterns with ridges and spaces.
Details
- Language :
- English
- ISSN :
- 10438092
- Volume :
- 42
- Issue :
- 4
- Database :
- Academic Search Index
- Journal :
- Laser Focus World
- Publication Type :
- Periodical
- Accession number :
- 20608636