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Formation and characterization of long-chained alkylsiloxane self-assembled monolayers on atomic-layer-deposited aluminum oxide surfaces.
- Source :
-
Applied Physics A: Materials Science & Processing . Jul2006, Vol. 84 Issue 1/2, p1-5. 5p. 1 Diagram, 3 Graphs. - Publication Year :
- 2006
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Abstract
- We report the formation of highly robust long-chained alkylsiloxane self-assembled monolayers (SAMs) on aluminum oxide films prepared by atomic-layer deposition (ALD). The surface chemistry and the morphological characteristics of the SAMs were examined by X-ray photoelectron spectroscopy, infrared spectroscopy, atomic-force microscopy, and contact-angle goniometry. The octadecylsiloxane-derived SAMs initially hydrolyze and deposit on the alumina surface as ∼1.8 nm thick, monolayer-high islands ≤50 nm in diameter. The size of these islands increases with time, likely through a surface-diffusion aggregation process. Coalescence of neighboring islands leads to a densely packed and robust monolayer on the alumina surface. The SAMs on ALD alumina are expected to be useful in a number of nanostructure applications where the combination of conformal alumina deposition and conformal coverage of the alumina by an organic layer is critical. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09478396
- Volume :
- 84
- Issue :
- 1/2
- Database :
- Academic Search Index
- Journal :
- Applied Physics A: Materials Science & Processing
- Publication Type :
- Academic Journal
- Accession number :
- 20791585
- Full Text :
- https://doi.org/10.1007/s00339-006-3595-z