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The impact on the magnetic field growth of half-metallic Fe3O4 thin films
- Source :
-
Journal of Solid State Chemistry . Jun2006, Vol. 179 Issue 6, p1618-1622. 5p. - Publication Year :
- 2006
-
Abstract
- Abstract: Half-metallic Fe3O4 films grown on a Si (100) substrate with a tantalum (Ta) buffer layer were prepared by DC magnetron reactive sputtering. Primary emphasis was placed on magnetic field growth of Fe3O4 thin film. The experiment''s results showed that applying an external magnetic field to the samples during the growth was efficient to promote the polycrystalline Fe3O4 growth along certain directions. The magnetoresistance (MR) was also tested for comparison of the samples prepared with and without an external magnetic field, and showed that applying an external magnetic field can promote the MR values. [Copyright &y& Elsevier]
- Subjects :
- *MAGNETIC fields
*THIN films
*SURFACES (Technology)
*MAGNETICS
Subjects
Details
- Language :
- English
- ISSN :
- 00224596
- Volume :
- 179
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Journal of Solid State Chemistry
- Publication Type :
- Academic Journal
- Accession number :
- 20981963
- Full Text :
- https://doi.org/10.1016/j.jssc.2006.04.007