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Protein patterning using a microstructured organosilane layer fabricated by VUV light lithography as a template

Authors :
Yamaguchi, Munehiro
Nishimura, Okio
Lim, Sung-Hyuk
Shimokawa, Katsuyoshi
Tamura, Tomohiro
Suzuki, Masaaki
Source :
Colloids & Surfaces A: Physicochemical & Engineering Aspects. Aug2006, Vol. 284-285, p532-534. 3p.
Publication Year :
2006

Abstract

Abstract: We successfully fabricated a protein pattern using a microstructured organosilane layer fabricated by vacuum ultraviolet light (VUV) lithography and subsequently by chemical modification of organosilane layer for immobilization of proteins. An amino-terminated organosilane layer was formed using aminopropyltriethoxysilane (APTES) by the liquid method on quartz glass. This organosilane layer was patterned by VUV etching through a metal mask. The residual amino groups were chemically modified for immobilization of proteins. Fluorescent protein (ECFP) was immobilized to the chemically modified pattern, and a clear ECFP pattern was confirmed with a fluorescent microscope after the removal of non-specifically bound ECFP. This technique can be applied to almost all the proteins and will be useful for biotechnology, such as neuronal cell arrangement. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
09277757
Volume :
284-285
Database :
Academic Search Index
Journal :
Colloids & Surfaces A: Physicochemical & Engineering Aspects
Publication Type :
Academic Journal
Accession number :
21208170
Full Text :
https://doi.org/10.1016/j.colsurfa.2005.10.089