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A diffusion model for picosecond electron bunches from negative electron affinity GaAs photocathodes.

Authors :
Hartmann, P.
Bermuth, J.
Source :
Journal of Applied Physics. 8/15/1999, Vol. 86 Issue 4, p2245. 5p. 1 Diagram, 7 Graphs.
Publication Year :
1999

Abstract

Presents information on a study which offered precise measurements of picosecond electron bunches from a negative affinity bulk gallium-arsenic (GaAs) photocathode. Methodology of the study; Results and discussion on the study.

Subjects

Subjects :
*ELECTRONS
*GALLIUM
*ARSENIC
*PHOTOCATHODES
*MEASUREMENT

Details

Language :
English
ISSN :
00218979
Volume :
86
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
2232574
Full Text :
https://doi.org/10.1063/1.371037
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