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The effect of Ehrlich–Schwoebel step-edge barrier on the formation of self-organized Si nanodots by ion-sputter erosion
- Source :
-
Applied Surface Science . Mar2007, Vol. 253 Issue 10, p4497-4500. 4p. - Publication Year :
- 2007
-
Abstract
- Abstract: The ion flux dependence of the self-organized Si nanodots induced by 1.5keV Ar+ ion sputter erosion has been studied. It shows that for the regime with ion flux >∼280μA/cm2, the currently adopted Bradley–Harper (BH) model, which is incorporated in a dynamic continuum equation holds valid. However, for ion flux <∼280μA/cm2, the measured dot size and surface roughness deviate drastically from the BH model. To interpret the data for this lower ion flux regime, the effect of the Ehrlich–Schwoebel (ES) step-edge barrier was introduced into the continuum equation. A consistency between the calculated and the experimental results was reached, furthermore, a reasonable trend was found, that is, the effective ES diffusion decreases steadily with the increasing ion flux, and at ∼280μA/cm2, it became negligibly small. [Copyright &y& Elsevier]
- Subjects :
- *SILICON
*IONS
*SURFACE roughness
*MATHEMATICAL continuum
Subjects
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 253
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 24138091
- Full Text :
- https://doi.org/10.1016/j.apsusc.2006.09.065