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Polishing of polycrystalline diamond by the technique of dynamic friction. Part 2: Material removal mechanism
- Source :
-
International Journal of Machine Tools & Manufacture . Aug2007, Vol. 47 Issue 10, p1615-1624. 10p. - Publication Year :
- 2007
-
Abstract
- Abstract: This paper investigates the material removal mechanisms of PCD using the dynamic friction polishing technique. Scanning electron microscopy, energy dispersive X-ray, X-ray diffraction and Raman spectroscopy were used to identify the mechanisms by analyzing the specimen surfaces and debris produced by polishing. It was found that the material removal occurred in a rather complex way, which can be a chemo-mechanical process, diffusion, oxidization and evaporation, or their combinations. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 08906955
- Volume :
- 47
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- International Journal of Machine Tools & Manufacture
- Publication Type :
- Academic Journal
- Accession number :
- 24709720
- Full Text :
- https://doi.org/10.1016/j.ijmachtools.2006.11.003