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Surface-plasmon polariton interference nanolithography based on end-fire coupling

Authors :
Guo, Xiaowei
Du, Jinglei
Luo, Xiangang
Du, Chunlei
Guo, Yongkang
Source :
Microelectronic Engineering. May2007, Vol. 84 Issue 5-8, p1037-1040. 4p.
Publication Year :
2007

Abstract

Abstract: We have preformed finite-difference time-domain (FDTD) analysis of surface-plasmon polaritons (SPPs) interference nanolithography based on end-fire coupling method. The simulated results show the interference of two face-to-face SPPs can fabricate an 80nm periodicity pattern at the incidence wavelength of 365nm, which surprisingly has long decay lengths for transverse and longitudinal directions and are insensitive to the focusing and alignment conditions. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01679317
Volume :
84
Issue :
5-8
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
24968136
Full Text :
https://doi.org/10.1016/j.mee.2007.01.028