Cite
Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer
MLA
Park, Tae Joo, et al. “Enhancement in Thermal Stability of Atomic Layer Deposited HfO2 Films by Using Top Hf Metal Layer.” Microelectronic Engineering, vol. 84, no. 9/10, Sept. 2007, pp. 2226–29. EBSCOhost, https://doi.org/10.1016/j.mee.2007.04.082.
APA
Park, T. J., Kim, J. H., Jang, J. H., Seo, M., Na, K. D., & Hwang, C. S. (2007). Enhancement in thermal stability of atomic layer deposited HfO2 films by using top Hf metal layer. Microelectronic Engineering, 84(9/10), 2226–2229. https://doi.org/10.1016/j.mee.2007.04.082
Chicago
Park, Tae Joo, Jeong Hwan Kim, Jae Hyuck Jang, Minha Seo, Kwang Duk Na, and Cheol Seong Hwang. 2007. “Enhancement in Thermal Stability of Atomic Layer Deposited HfO2 Films by Using Top Hf Metal Layer.” Microelectronic Engineering 84 (9/10): 2226–29. doi:10.1016/j.mee.2007.04.082.