Simultaneous monitoring of multimetallic atom densities in plasma processes employing a multimicrohollow cathode lamp.

The authors have developed a simultaneous measurement technique of multimetallic atom densities in process plasmas using absorption spectroscopy employing a multimicrohollow cathode plasma as a light source. The optical emissions of four metallic atoms of Cu, Zn, Fe, and Mo were simultaneously produced from the multimicrohollow cathode plasma of millimeter size. The absolute densities of Cu and Mo in the magnetron sputtering plasma were simultaneously measured using this technique. The simultaneous monitoring of multimetallic atoms is very useful for controlling the plasma processes precisely. [ABSTRACT FROM AUTHOR]