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The effect of N-channel polysilicon thin-film transistors with body-block spacers

Authors :
Lin, Jyi-Tsong
Huang, Kuo-Dong
Hu, Shu-Fen
Source :
Solid-State Electronics. Jul2007, Vol. 51 Issue 7, p1056-1061. 6p.
Publication Year :
2007

Abstract

Abstract: This study investigates structural modifications of the conventional TFT, which is suffers from the short-channel effect in advanced applications. An ideal body-block poly-Si thin-film transistor is successfully fabricated for the first time at a level that achieves high performance characteristics. The output characteristics of the body-block TFT, for instance, the low output conductance in the saturation area and high breakdown voltage, achieve an outstanding improvements compared to a conventional TFT. The poly-Si thin-film treatments of the body-block TFT with NH3 diffusion or body implantation, and their corresponding performance effects, have also been investigated and discussed in depth. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00381101
Volume :
51
Issue :
7
Database :
Academic Search Index
Journal :
Solid-State Electronics
Publication Type :
Academic Journal
Accession number :
25936564
Full Text :
https://doi.org/10.1016/j.sse.2007.02.043