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Doubling down at BACUS.
- Source :
-
Solid State Technology . Nov2007, Vol. 50 Issue 11, p24-26. 2p. - Publication Year :
- 2007
-
Abstract
- Information about the topics discussed at the annual BACUS Symposium on Photomask Technology in Monterey, California on September 16-21, 2007 is presented. Accordingly, the discussion was centered on the use of double patterning technology (DPT) for half-pitch node among maskmakers. The event featured several members from participating companies including, Artur Balasinski of Cypress Semiconductor Inc., Don Samuels of the International Business Machines Corp. and Robert Bigwood of Intel Corp.
- Subjects :
- *CONFERENCES & conventions
*COMPUTER industry
Subjects
Details
- Language :
- English
- ISSN :
- 0038111X
- Volume :
- 50
- Issue :
- 11
- Database :
- Academic Search Index
- Journal :
- Solid State Technology
- Publication Type :
- Academic Journal
- Accession number :
- 27434586