THE OXIDATION AND THE ELECTRICAL PROPERTIES OF Ni–Cr THIN FILM AFTER RAPID THERMAL ANNEALING.

By controlling the sputtering power, rotational speed of the substrate and sputtering time, Ni–Cr thin films with appropriate composition were fabricated by double-target magnetron co-sputtering techniques. The homogeneity and oxidation of Ni–Cr thin film has been studied by Auger electron spectroscopy (AES). The structures of Ni–Cr thin films were determined by an X-ray diffractometer (XRD). The oxidation and the resistance stability of the Ni–Cr thin film after rapid thermal process (RTP) have been studied. The relations between TCR and RTP techniques of Ni–Cr thin films were discussed. [ABSTRACT FROM AUTHOR]