CARACTERIZACIÓN MEDIANTE DIFRACCIÓN DE RAYOS X DE ELECTRORECUBRIMIENTOS CU/CD SOBRE SUSTRATOS DE ZAMAK OBTENIDOS CON LAS TÉCNICAS DC, PDC Y PRC.

This work presents the use of the technique of current pulsant inverse, pulse direct current and direct current for electrodeposition thin films Cu/Cd in double-layer shape on Zamak substrate. The influence of the different variables was studied involved in each one of the processes: voltage and time of deposition (VHigh and tHigh), voltage and time of breakup (VLow and tLow) and the load cycle (θ=tHigh/tHigh+tLow), obtaining as answer the monitory of the average anodic (ILow) and cathodic (IHigh) in function of the time anodic (tLow) and cathodic (tHigh), respectively. The electrodeposits of Cu/Cd was characterized by means ray x diffraction being observed the structure and composition in each one of the films obtained. It was observed that the control pulsant of the voltage during the deposit to influence in the composition of the electrodeposits. [ABSTRACT FROM AUTHOR]