Analysis on microstructure of interface layer in DLC/Si structures produced by FIB–CVD

Abstract: To aid investigation of formation processes and/or adhesiveness properties, microstructures of the interface between diamond-like carbon (DLC) film produced by focused ion-beam chemical vapor deposition method and crystalline Si substrate were analyzed by high-resolution transmission electron microscopy (HRTEM) in detail. Bright field images showed that a transition layer existed at the DLC/Si interface. From EDS analysis, it was found that the transition layer consisted of both C and Si atoms and their concentrations varied continuously along growth direction over about 100 nm. In addition, HRTEM image and convergence beam electron diffraction pattern revealed that the transition layer was divided structurally into three layers, i.e., amorphous, clustered and crystalline Si–C layers. [Copyright &y& Elsevier]