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The interaction between platinum films and silicon substrates: Effects of substrate bias during sputtering deposition.

Authors :
Shi, J.
Kojima, D.
Hashimoto, M.
Source :
Journal of Applied Physics. 8/1/2000, Vol. 88 Issue 3, p1679. 5p. 1 Diagram, 6 Graphs.
Publication Year :
2000

Abstract

Studies the reactions between platinum and silicon, both during platinum deposition at elevated temperature and during a thermal annealing process, by x-ray diffraction. Microstructure of as-deposited and annealed Pt/Si films; Distribution of Pt, Si an O in the films; Interface state of the films deposited with a substrate bias.

Details

Language :
English
ISSN :
00218979
Volume :
88
Issue :
3
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
3397480
Full Text :
https://doi.org/10.1063/1.373871