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The interaction between platinum films and silicon substrates: Effects of substrate bias during sputtering deposition.
- Source :
-
Journal of Applied Physics . 8/1/2000, Vol. 88 Issue 3, p1679. 5p. 1 Diagram, 6 Graphs. - Publication Year :
- 2000
-
Abstract
- Studies the reactions between platinum and silicon, both during platinum deposition at elevated temperature and during a thermal annealing process, by x-ray diffraction. Microstructure of as-deposited and annealed Pt/Si films; Distribution of Pt, Si an O in the films; Interface state of the films deposited with a substrate bias.
- Subjects :
- *PLATINUM
*SILICON
*ANNEALING of metals
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 88
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 3397480
- Full Text :
- https://doi.org/10.1063/1.373871