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A 300-mm Semiconductor Manufacturing Foreign Material Reduction Initiative.

Authors :
Long, Christopher W.
Sienkiewicz, Thomas
Pfeiffer, Gerd
Guse, Michael
Peterman, James
Brendler, Andrew
Source :
IEEE Transactions on Semiconductor Manufacturing. Aug2008, Vol. 21 Issue 3, p308-315. 8p. 6 Black and White Photographs, 15 Graphs.
Publication Year :
2008

Abstract

It is well established that foreign material (FM) in a semiconductor manufacturing process can result in significant unplanned tool down time, reduced product yields, and potential reliability performance issues. This paper will present an overview of the strategy and subsequent results of a multifaceted effort to reduce FM impact during the ramp up of the IBM 300-mm semiconductor manufacturing facility in Hopewell Junction, NY. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
08946507
Volume :
21
Issue :
3
Database :
Academic Search Index
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
34138375
Full Text :
https://doi.org/10.1109/TSM.2008.2001203