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Numerical band-to-band tunnelling model for radio-frequency silicon tunnel diode with negative-differential resistance.

Authors :
Kim, K. R.
Park, B.-G.
Dutton, R. W.
Source :
Electronics Letters (Institution of Engineering & Technology). 11/6/2008, Vol. 44 Issue 23, p1379-1381. 3p. 3 Graphs.
Publication Year :
2008

Abstract

The low resistive band-to-band tunnelling (BTBT) model has been developed for radio-frequency (RF) silicon negative differential resistance (NDR) device simulation on the TCAD platform. The BTBT mechanism in a forward-biased tunnel junction is modelled based on a generation–recombination term in a continuity equation by considering a spatially varying electric field through the tunnelling distance. Using this model, DC/AC characteristics of silicon NDR devices have been successfully described on a numerical device simulation platform. The calculated speed index from the junction capacitance and peak tunnelling current of the tunnel diode shows good agreement with experiments. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00135194
Volume :
44
Issue :
23
Database :
Academic Search Index
Journal :
Electronics Letters (Institution of Engineering & Technology)
Publication Type :
Academic Journal
Accession number :
35054970
Full Text :
https://doi.org/10.1049/el:20082737