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Fault Detection of Plasma Etchers Using Optical Emission Spectra.
- Source :
-
IEEE Transactions on Semiconductor Manufacturing . Aug2000, Vol. 13 Issue 3, p374. 12p. 2 Diagrams, 1 Chart, 11 Graphs. - Publication Year :
- 2000
-
Abstract
- Investigates the suitability of using optical emission spectroscopy in fault detection and classification of plasma etchers. Collection of spectra at different wavelengths; Extraction of multiple scans of the spectra from a semiconductor wafer; Proposal of a multiway principal component analysis to analyze the sensitivity of multiple scans within a wafer.
- Subjects :
- *OPTICAL measurements
*EMISSION spectroscopy
*PLASMA etching
*SEMICONDUCTOR wafers
Subjects
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 13
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- 3542434
- Full Text :
- https://doi.org/10.1109/66.857948