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Anodization of Ti Thin Film Deposited on ITO.
- Source :
-
Langmuir . Jan2009, Vol. 25 Issue 1, p509-514. 6p. - Publication Year :
- 2009
-
Abstract
- We have investigated several key aspects for the self-organization of nanotubes in RF sputtered titanium (Ti) thin films formed by the anodization process in fluoride-ion-containing neutral electrolytes. Ti films were deposited on indium tin oxide (ITO) glass substrates at room temperature and 300 °C, and then anodized. The films were studied using scanning electron microscopy (SEM), X-ray diffraction (XRD), and UVâvis spectrometry before and after anodization. It was observed that anodization of high temperature deposited films resulted in nanotube type structures with diameters in the range of 10â45 nm for an applied voltage of 5â20 V. In addition, the anatase form of TiO2is formed during the anodization process which is also confirmed using photocurrent measurements. However, the anodization of room temperature deposited Ti films resulted in irregular pores or holes. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07437463
- Volume :
- 25
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- Langmuir
- Publication Type :
- Academic Journal
- Accession number :
- 35912067
- Full Text :
- https://doi.org/10.1021/la802456r