PELICULAS DE TI6AL4V CRECIDAS SOBRE ACEROS 316L MEDIANTE LA TECNICA DE PULVERIZACION CATODICA MAGNETRON RF Y NITRURADAS POR PLASMA.

In this work thin films of Ti6Al4V have been grown by rf magnetron sputtering, on steel 316L and they have been subjected to a later treatment of nitrurated by plasma, in function of the time, to settle down if changes exist in the mechanical properties for the incorporation from the nitrogen to the crystalline lattice of the film. The conditions used to grow these films were: Pressure 7x10-3 mbar, time of 1 hour and with a power 400 W. The films were nitrurated to a difference of potential of 500 V, to a pressure of 3 torr. The results of EDX reveal that the films this compound on the average of 78,3% Wt of Ti, 6.% Wt of Al, 12.0% Wt of V and 2.1 Wt % N. On the other hand, the results of DRX show that the film grows along the plane (110) of the β phase (Ti stabilized with V) of the alloy. Finally, the mechanical tests carried out on the films nitrurated indicate that the microhardness increases lightly. [ABSTRACT FROM AUTHOR]