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On-wafer characterization of In[sub 0.52]Al[sub 0.48]As/In[sub 0.53]Ga[sub 0.47]As....

Authors :
Zeng, A.
Jackson, M.K.
Source :
Applied Physics Letters. 7/10/1995, Vol. 67 Issue 2, p262. 2p. 1 Black and White Photograph, 1 Diagram, 1 Graph.
Publication Year :
1995

Abstract

Investigates the fabrication of indium[sub 0.52]aluminum[sub 0.48]arsenic/indium[sub 0.53]gallium[sub 0.47]arsenic modulation-doped field-effect transistors. Incorporation of photoconductive switches; Details on the switching time of the T-gate device; Utilization of on-wafer integration of high-speed test fixtures.

Details

Language :
English
ISSN :
00036951
Volume :
67
Issue :
2
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4167923
Full Text :
https://doi.org/10.1063/1.114687