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Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate.
- Source :
-
Applied Physics Letters . 1/20/1992, Vol. 60 Issue 3, p322. 2p. 3 Graphs. - Publication Year :
- 1992
-
Abstract
- Examines the preparation of aluminum oxide thin films on glass and silicon substrates using a low-temperature atmospheric-pressure vapor deposition method. Employment of aluminum acetylacetonate as source material; Measurement of the film composition by photoelectron microscopy; Details on the lowering of substrate temperature.
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 60
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 4240634
- Full Text :
- https://doi.org/10.1063/1.106699