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Near-field scanning optical nanolithography using amorphous silicon photoresists.
- Source :
-
Applied Physics Letters . 1/4/1999, Vol. 74 Issue 1, p141. 3p. 3 Black and White Photographs, 2 Graphs. - Publication Year :
- 1999
-
Abstract
- Studies near-field scanning optical nanolithography using amorphous silicon photoresists. Production of films that are stable over several days; Patterns with line heights equal to the original film thickness.
- Subjects :
- *LITHOGRAPHY
*SILICON
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 74
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 4290668
- Full Text :
- https://doi.org/10.1063/1.122976