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Poly(3-hexylthiophene) based field-effect transistors with gate SiO2 dielectric modified by multi-layers of 3-aminopropyltrimethoxysilane

Authors :
Saxena, Vibha
Chauhan, A.K.
Padma, N.
Aswal, D.K.
Koiry, S.P.
Sen, Shashwati
Tokas, R.B.
Gupta, S.K.
Sürgers, C.
Yakhmi, J.V.
Source :
Thin Solid Films. Sep2009, Vol. 517 Issue 21, p6124-6128. 5p.
Publication Year :
2009

Abstract

Abstract: Top-contact organic field-effect transistors based on poly(3-hexylthiophene) (P3HT) active layer were fabricated using gate dielectric (SiO2) modified with 3-aminopropyltrimethoxysilane (APTMS) multilayers. It has been demonstrated that the treatment of dielectric with APTMS enhances the field-effect mobility as well as the on/off ratio of the devices by nearly two orders of magnitude. This is attributed to conformational changes as well as to an improved uniformity of the spin coat P3HT films on the APTMS-modified substrate as revealed by atomic force microscopy, Fourier transform infrared spectroscopy and UV–Vis measurements. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
517
Issue :
21
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
42963707
Full Text :
https://doi.org/10.1016/j.tsf.2009.05.031