Back to Search
Start Over
Discharge characteristics of plasma display panels with Si-doped MgO protective layers
- Source :
-
Thin Solid Films . Oct2009, Vol. 517 Issue 23, p6252-6255. 4p. - Publication Year :
- 2009
-
Abstract
- Abstract: We report on our study of the influence of varying concentrations of Si doping on the secondary electron emission (SEE) yield of MgO thin films prepared by electron beam evaporation technique. The series of Si-doped MgO films were microstructurally characterized with various tools like X-ray diffraction, scanning electron microscopy and atomic force microscopy. The optimization of the concentration of Si doping is seen to enhance the SEE yield. We discuss the correlation of SEE yield in the context of different deposition and measurement conditions and crystalline orientation. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 00406090
- Volume :
- 517
- Issue :
- 23
- Database :
- Academic Search Index
- Journal :
- Thin Solid Films
- Publication Type :
- Academic Journal
- Accession number :
- 43766495
- Full Text :
- https://doi.org/10.1016/j.tsf.2009.02.111