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Interview.
- Source :
-
Electronics Letters (Institution of Engineering & Technology) . 5/13/2010, Vol. 46 Issue 10, p666-666. 1p. 1 Color Photograph. - Publication Year :
- 2010
-
Abstract
- Dr Xiaobin Yuan from the Microelectronics Division of IBM and author of the Letter ‘Transistor mismatch in 32 nm high-k metal-gate process’ on page 708 tells us more about his research into advanced process technologies. [ABSTRACT FROM AUTHOR]
- Subjects :
- *TRANSISTORS
*MICROELECTRONICS
Subjects
Details
- Language :
- English
- ISSN :
- 00135194
- Volume :
- 46
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- Electronics Letters (Institution of Engineering & Technology)
- Publication Type :
- Academic Journal
- Accession number :
- 50510911
- Full Text :
- https://doi.org/10.1049/el.2010.9047